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US 2007/0166649 A1Published application
Method of forming a micro device
OwnerCheng-Hung Yuinventor
Life of this patent
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Abstract
A method of forming a micro device includes using a light source which has a first wavelength beaming to a photo resist which is suited for a second wavelength, developing the photo resist which is suited for the second wavelength to form a plurality of sensitization block, and performing a heating process on the sensitization block to form a micro device.
Claims24
A method of forming a micro device comprising:
- utilizing a light source that has a first wavelength beaming to a photo resist which is specifically made for a second wavelength;
- developing the photo resist which is specifically made for the second wavelength to form a plurality of sensitization blocks;
- and
- performing a heating process on the sensitization blocks to form a micro device.
1 more element
A method of forming a micro-lens comprising:
- forming a sensitization layer;
- exposing the sensitization layer by a first wavelength UV;
- developing and forming a plurality of sensitization blocks, the sensitization block and the adjacent sensitization block have a sensitization block space;
- and
- processing a reflow process to make the sensitization block become a micro-lens, the micro-lens and the adjacent micro-lens have no space, and forming a gapless micro-lens.
2 more elements
Dependencies are inferred from the claim text.