Chalcogenide precursor compound and method for preparing chalcogenide thin film using the same
OwnerHyun Jeong, Jong Seon +2inventors
InventorsHyun Jeong, Jong Seon, Hyeon Shin, Sang Hyun
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OwnerHyun Jeong, Jong Seon +2inventors
InventorsHyun Jeong, Jong Seon, Hyeon Shin, Sang Hyun
Estimating the term…
Disclosed herein are a soluble chalcogenide precursor compound and a method for preparing a chalcogenide thin film using the precursor compound by a solution deposition process, e.g., spin coating or dip coating. In the method, the use of the chalcogenide precursor as an inorganic semiconductor material soluble in organic solvents enables the preparation of a semiconductor thin film having excellent electrical and physical properties (e.g., crystallinity). In addition, a large-area thin film can be prepared by a solution deposition process, thus contributing to the simplification of procedures and reduction of preparation costs. Therefore, the method can be effectively applied in a wide variety of fields, such as thin film transistors, electroluminescent devices, photovoltaic cells and memory devices.
A chalcogenide precursor compound represented by Formula 1 below:
A method for preparing a chalcogenide thin film, the method comprising the steps of:
Dependencies are inferred from the claim text.