White defect repairing method and apparatus of photomask, manufacturing method of photomask, and manufacturing method of semiconductor device
AssigneeKabushiki Kaisha Toshiba
InventorShingo Kanamitsu
Life of this patent
Estimating the term…
Abstract
According to an aspect of the invention, there is provided a white defect repairing method of a photomask which repairs a white defect present at an edge portion of a pattern of the photomask, the method including forming a groove or a hole having a tilted side wall which inhibits passage of exposure light at a position corresponding to that of the white defect on a translucent substrate of the photomask.
Claims16
A white defect repairing method of a photomask which repairs a white defect present at an edge portion of a pattern of the photomask, the method comprising:
- forming a groove or a hole having a tilted side wall which inhibits passage of exposure light at a position corresponding to that of the white defect on a translucent substrate of the photomask.
A white defect repairing apparatus of a photomask which repairs a white defect present at an edge portion of a pattern of the photomask, the apparatus comprising:
- a probe;
- a movement means which moves the probe onto a translucent substrate of the photomask;
- an image acquisition means which acquires an image on the surface of the translucent substrate via the probe moved by the movement means;
- and
- a mechanism which specifies a repair position of the white defect based on the image acquired by the image acquisition means and which forms a groove or a hole having a tilted side wall to inhibit passage of exposure light at a position on the translucent substrate corresponding to the specified position.
A manufacturing method of a photomask, comprising:
- forming a groove or a hole having a tilted side wall to inhibit passage of exposure light at a position corresponding to a white defect present at an edge portion of a pattern of the photomask on a translucent substrate of the photomask to repair the defect, thereby manufacturing the photomask.
A manufacturing method of a semiconductor device, comprising:
- forming a circuit pattern on a semiconductor substrate by use of a photomask in which a groove or a hole having a tilted side wall to inhibit passage of exposure light is formed at a position corresponding to a white defect present at an edge portion of a pattern of the photomask on a translucent substrate of the photomask to repair the defect, thereby manufacturing the semiconductor device.
Dependencies are inferred from the claim text.