Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorArno Bleeker
Life of this patent
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Abstract
An array of individually controllable elements is comprised of elements, each formed of a stack of layers of dielectric material. At least one layer is an electro-optical material. The at least one layer's refractive index for radiation that is plane polarized in a given direction can be changed by application of a voltage in order to change the reflection/transmission characteristic of the boundary between this layer and the adjacent layer.
Claims18
A lithographic apparatus, comprising:
- an illumination system that produces a beam of radiation;
- an array of individually controllable elements that patterns the beam;
- and
- a projection system that projects the patterned beam onto a target portion of a substrate,
- wherein each element in the array of individually controllable elements comprises a stack of top, middle, and bottom dielectric layers, at least the middle dielectric layer comprising a solid state electro-optical material,
- whereby on application of a control signal the element is selectively changed between a first state and a second state, such that proportions of the radiation that are transmitted and reflected, respectively, at a boundary between the middle dielectric layer and at least one of the top or bottom dielectric layers are different in the first and second states.
An array of individually controllable elements that pattern a beam of radiation, wherein each element in the array of individually controllable elements comprises:
- top, middle, and bottom dielectric layers, at least the middle dielectric layer being formed of a solid state electro-optical material,
- wherein on application of a control signal the element is selectively changed between a first state and a second state, such that proportions of the radiation that are transmitted and reflected, respectively, at a boundary between the middle dielectric layer and at least one of the top or bottom dielectric layers are different in the first and second states.
A device manufacturing method, comprising:
- forming each element in an array of individually controllable elements from top, middle, and bottom dielectric layers;
- forming at least the middle dielectric layer from a solid state electro-optical material;
- patterning a beam of radiation from an illumination source using the array of individually controllable elements;
- and
- projecting the patterned beam onto a target portion of a substrate.
Dependencies are inferred from the claim text.