Illumination system for a microlithography projection exposure installation

An illumination system for a microlithography projection exposure system for illuminating an illumination field with light from a primary light source, comprising:

• a light distribution device configured to receive light from the primary light source and to produce a two-dimensional intensity distribution in a pupil-shaping surface of the illumination system,
• wherein the light distribution system is configured to variably set the two-dimensional intensity distribution,
• wherein the light distribution device has at least one optical modulation device configured to controllably change the angular distribution of the light incident on the optical modulation device and
• wherein an axicon system is arranged between the optical modulation device and the pupil-shaping surface.

An illumination system for a microlithography projection exposure installation for illuminating an illumination field with light from a primary light source, comprising:

• a light distribution device configured to receive light from the primary light source and to produce a two-dimensional intensity distribution in a pupil-shaping surface of the illumination system,
• wherein the light distribution device variably sets the two-dimensional intensity distribution,
• wherein the light distribution device has at least one optical modulation device to controllably change the angular distribution of the light incident on the optical modulation device, and
• wherein a space between the optical modulation device and the pupil-shaping surface is free of optical components.

An illumination system for a microlithography projection exposure installation for illuminating an illumination field with light from a primary light source, comprising:

• a light distribution device configured to receive light from the primary light source and to produce a two-dimensional intensity distribution in a pupil-shaping surface of the illumination system,
• wherein the light distribution device is configured to variably set the two-dimensional intensity distribution,
• wherein the light distribution device has at least one optical modulation device configured to controllably change the angular distribution of the light incident on the optical modulation device,
• wherein the optical modulation device has at least one mirror arrangement having an array of individual mirrors configured to be controlled individually, to change an angular distribution of the light incident on the mirror arrangement, and
• wherein the mirror arrangement comprises a first mirror group and at least a second mirror group, each group having at least one individual mirror, the individual mirrors of the mirror groups having at least one of differing sizes, differing shapes and differing curvature.

An illumination system for a microlithography projection exposure installation for illuminating an illumination field with light from a primary light source, comprising:

• a light distribution device configured to receive light from the primary light source and to produce a two-dimensional intensity distribution in a pupil-shaping surface of the illumination system,
• wherein the light distribution device is configured to variably set the two-dimensional intensity distribution, wherein the light distribution device has at least one optical modulation device configured to controllably change the angular distribution of the light incident on the optical modulation device,
• wherein the optical modulation device has at least one mirror arrangement having an array of individual mirrors configured to be controlled individually, to change an angular distribution of the light incident on the mirror arrangement, and
• wherein the individual mirrors are configured as adaptive mirrors configured for being adjusted in shape.

An illumination system for a microlithography projection exposure installation for illuminating an illumination field with light from a primary light source, comprising:

• a light distribution device configured to receive light from the primary light source and to produce a two-dimensional intensity distribution in a pupil-shaping surface of the illumination system,
• wherein the light distribution device is configured to variably set the two dimensional intensity distribution,
• wherein the light distribution device has at least one optical modulation device configured to controllably change the angular distribution of the light incident on the optical modulation device, and
• wherein the optical modulation device is an electro-optical element having an array of individual elements, which are formed as one of controllable diffraction gratings and acousto-optical elements.