Immersion photolithography scanner
AssigneeMicron Technology, Inc.
InventorH. Manning
Life of this patent
Estimating the term…
Abstract
An immersion photolithography system includes a lens system positioned to focus radiation emitted from the radiation source onto a workpiece or wafer on a stage. A liquid supply system provides liquid between the lens of the lens system closest to the wafer. A seal element encloses a volume of liquid which keeps the lower or wetted surface of the lens wet. The seal element may be located at a lens parking location adjacent to the stage. The system provides an improved way for keeping the lens wet between exposure processing.
Claims46
An immersion photolithography system, comprising:
- an electromagnetic radiation source;
- a lens system positioned to focus radiation emitted from the radiation source, with the lens system including a first lens;
- a workpiece support positionable into alignment with the first lens, to allow radiation emitted by the radiation source and focused by the first lens to impinge on the workpiece;
- a liquid supply system for providing liquid between the first lens and the workpiece;
- and
- a seal element for enclosing a volume of liquid which maintains at least one surface area of the first lens wet.
An immersion photolithography system, comprising:
- a light source;
- a lens system positioned to focus light from the light source, with the lens system including a first lens;
- at least one wafer stage;
- a liquid supply system for providing liquid between the first lens and the wafer stage;
- a drive system for moving the wafer stage relative to the first lens;
- and
- a lens parking station adjacent to the wafer stage, with the first lens moveable from a position over or under the stage, to a position over or under the parking station.
A method of immersion photolithography, comprising:
- projecting radiation onto a substrate through a lens and through a liquid between the lens and the substrate;
- moving the substrate relative to the lens, to form a repeated pattern on the substrate;
- confining the liquid to an area adjacent to the lens while forming the repeated pattern, using a liquid confinement system;
- moving a lens parking station relative to the lens, to position the lens in the lens parking station;
- and
- continuing to confine the liquid to an area adjacent to the lens, using the liquid confinement system, while the lens is in the lens parking station.
Immersion photolithography, comprising:
- forming a feature on a wafer by passing light through a lens and through a liquid between the lens and the wafer;
- moving the wafer and the lens relative to each other,
- keeping the liquid in contact with the lens while forming the feature;
- moving a seal element to a position adjacent to the lens, after forming the feature on the wafer, with the seal element keeping liquid in contact with the lens.
An immersion photolithography system, comprising:
- radiation means for providing electromagnetic radiation;
- focus means for focusing radiation emitted from the radiation means;
- workpiece support support means for supporting a workpiece while the workpiece is exposed to radiation emitted by the radiation means and focused by the focus means;
- liquid supply means for providing liquid to the workpiece;
- and
- liquid enclosing means for enclosing a volume of liquid which maintains at least one surface the focus means wet.
An immersion photolithography system, comprising:
- light source means for providing an exposure light;
- focus means for focusing light from the light source means, with the focus means including a first lens;
- at least one wafer stage;
- liquid supply means for providing liquid between the first lens and the wafer stage;
- drive means for moving the wafer stage relative to the first lens;
- and
- an idle location to one side of the wafer stage, with the first lens moveable from a position over or under the stage, to the idle location.
Photolithography in a scanning system, comprising:
- directing light onto a substrate through a lens and through a liquid between the lens and the substrate;
- forming a repeated pattern on the substrate by exposing areas of the substrate to the light;
- holding the liquid around the lens while forming the repeated pattern, using a liquid holding element;
- moving a lens wetting station relative to the lens, to position the lens in the lens wetting station;
- and
- continuing to hold the liquid around the lens, using the liquid holding element, while the lens is in the lens wetting station.
In an immersion photolithography system of the type having an electromagnetic radiation source, and a lens system positioned to focus radiation emitted from the radiation source, and a workpiece support positionable into alignment with the lens system, to allow radiation emitted by the radiation source and focused by the lens system to expose a workpiece, and a liquid supply system for providing liquid between the lens system and the workpiece, the improvement comprising a lens wetting station adjacent to the workpiece support, with the lens wetting station including wetting means for keeping at least one part of the lens system wet, when the immersion photolithography system is idle.
Photolithography in a scanning system, comprising:
- performing a step to form a repeated pattern on a substrate using light passing through a lens and a liquid;
- performing a step to keep the lens wet while forming the repeated pattern;
- and
- performing a step to keep the lens wet when the scanning system is idle.
Dependencies are inferred from the claim text.