Gas distribution apparatuses and methods for controlling gas distribution apparatuses
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYi-Li Hsiao, Chen-Hua Yu, Jean Wang, Lawrance Sheu
Life of this patent
Estimating the term…
Abstract
A gas distribution apparatus includes a first plate and a second plate comprising a plurality of first openings and second openings, respectively. The second plate is disposed in overlapping relation with the first plate. Overlaps of the first openings and the second openings form third openings, which provide a first gas distribution pattern at a first orientation of the plates relative to one another and a second gas distribution pattern at a second orientation different than the first orientation.
Claims20
A gas distribution apparatus, comprising:
- a first plate comprising a plurality of first openings;
- and
- a second plate disposed in overlapping relation with the first plate, the second plate comprising a plurality of second openings, wherein overlaps of the first openings and the second openings form third openings, the third openings providing a first gas distribution pattern at a first orientation of the plates relative to one another and a second gas distribution pattern at a second orientation different than the first orientation.
An apparatus, comprising:
- a gas distribution apparatus comprising:
- a first disk comprising a plurality of groups of radially spaced first openings having an oval shape;
- and
- a second disk disposed in overlapping relation with the first disk, the second disk comprising a plurality of groups of radially spaced second openings, each group corresponding to a group from the first disk, at least some of the second openings having shapes whose one-half side area is larger than the other-half side area, wherein the first disk is rotationally movable with respect to the second disk, overlaps of the first and second openings forming third openings, the third openings providing a first gas distribution pattern at a first rotational orientation of the disks relative to one another and a second gas distribution pattern at a second rotational orientation different than the first orientation, areas of at least some of the third openings being different in the first orientation than the second orientation;
- a chamber comprising a stage therein, the stage being disposed under the gas distribution apparatus;
- a power supply coupled to the gas distribution apparatus;
- at least one actuator coupled to the gas distribution apparatus;
- and
- a processor incommunication with the actuator, the processor providing a control signal corresponding to a predetermined recipe to the actuator to control the orientation of the first and second disks relative to one another.
A method of controlling a gas distribution apparatus, comprising steps of:
- (a) orientating a first plate comprising a plurality of first openings with respective to a second plate comprising a plurality of second openings so that overlaps of the first openings and the second openings form third openings corresponding to a selected gas distribution pattern, the third openings providing a first gas distribution pattern at a first orientation of the plates relative to one another and a second gas distribution pattern at a second orientation different than the first orientation;
- and
- (b) providing a gas by way of the third openings to a chamber.
Dependencies are inferred from the claim text.