Gas supply system and processing system
OwnerShigeru Kasai, Sumi Tanaka +3inventors
InventorsShigeru Kasai, Sumi Tanaka, Tetsuya Saito, Norihiko Yamamoto, Kenichi Yanagitani
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OwnerShigeru Kasai, Sumi Tanaka +3inventors
InventorsShigeru Kasai, Sumi Tanaka, Tetsuya Saito, Norihiko Yamamoto, Kenichi Yanagitani
Estimating the term…
A processing system that can supply a material gas produced inside a material reservoir tank into a processing apparatus while generating almost no pressure loss is provided. In a processing system comprising: a processing apparatus including a gas injection means 42 for injecting a specific material gas into a processing vessel 26 in order to provide specific processing to an object to be processed W, said material gas being produced from a metallic compound material M with low vapor pressure; and a gas supply system 24 for supplying said specific material gas to said gas injection means, said gas injection means is a shower head portion and said gas supply system provides: a gas passage 56 extending upwardly from said showerhead portion; a material reservoir tank 58 attached to the upper-end portion of said gas passage for containing said metallic compound material therein; and an open/close valve 60 for opening/closing said gas passage.
A gas:
A processing system comprising:
A processing system comprising:
Dependencies are inferred from the claim text.