Thin film preparation apparatus
AssigneeMitsubishi Heavy Industries, Ltd.
InventorsKeeyoung Jun, Hitoshi Sakamoto, Suguru Noda
Life of this patent
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Abstract
A thin film preparation apparatus performs film formation by supplying a precursor CuCl with increased supply accuracy and Cl* from a material supply apparatus outside a chamber into the chamber with the use of a member to be etched, which has been temperature-controlled independently, and depositing a Cu component of the CuCl on a substrate, without complicating temperature control (simply by heating control by a heater), and without the influence of radiation from a plasma.
Claims15
A material supply apparatus, connected to a chamber accommodating a substrate, for supplying a gas serving as a material for a thin film into the chamber, the material supply apparatus comprising:
- a member to be etched, the member being formed of a material containing an element capable of forming at least one high vapor pressure halide;
- heating means for heating the member, to be etched, to a predetermined temperature;
- and
- a material passage for bringing a halogen gas into contact with the member to be etched, which has been heated to the predetermined temperature, to form a gas of a precursor as a compound of the element and a halogen, and supplying the gas into the chamber.
A material supply apparatus, connected to a chamber accommodating a substrate, for supplying a gas serving as a material for a thin film into the chamber, and supplying radicals for deposition of the thin film into the chamber, the material supply apparatus comprising:
- a member to be etched, the member being formed of a material containing an element capable of forming at least one high vapor pressure halide;
- heating means for heating the member, to be etched, to a predetermined temperature;
- a material passage for bringing a halogen gas into contact with the member to be etched, which has been heated to the predetermined temperature, to form a gas of a precursor as a compound of the element and a halogen, and supplying the gas into the chamber;
- and
- a radical passage for bringing the halogen gas into contact with the heating means to obtain halogen gas radicals, and supplying the halogen gas radicals into the chamber.
Dependencies are inferred from the claim text.