Chemical vapor deposition apparatus having a reaction chamber condition detection function and a detection method thereof

A method of detecting a reaction chamber condition of a chemical vapor deposition apparatus;

• the chemical vapor deposition apparatus comprising a heating holder positioned in a reaction chamber;
• a shower head positioned substantially parallel to and above the heating holder in the reaction chamber, the heating holder and the shower head forming a capacitor;
• and a reaction chamber condition detector, electrically connected to the heating holder and the shower head, comprising a resistor connected to the capacitor in series so as to form an RC circuit;
• the method comprising:
• (a) adjusting the heating holder and the shower head to a detection position;
• (b) utilizing the reaction chamber condition detector to charge and to discharge the capacitor, and calculating a detected value;
• and
• (c) comparing the detected value and an ideal value, if the detected value substantially equals to the ideal value, a reaction chamber condition is normal, if the detected value differs from the ideal value, the reaction chamber condition is shifted.