Method of recipe control operation
AssigneeASM Japan K.K.
InventorsMasahiro Takizawa, Takashi Wada, Satoru Noguchi
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Abstract
An operation method of a recipe control process in which multiple processing targets are processed continuously in a processing apparatus using recipes that specify a set of control parameters specifying the processing conditions of processing targets. The method comprises the steps of: (I) specifying correction coefficients to correct at least one of the parameters' values for each processing target, separately from the recipes, and (II) performing the recipe control process for multiple processing targets and applying the correction coefficients to each processing target to adjust the parameters' values.
Claims21
An operation method of a recipe control process in which multiple processing targets are processed under conditions continuously in a processing apparatus using recipes that specify a set of control parameters specifying the processing conditions of processing targets, said method comprising the steps of:
- specifying correction coefficients which correct at least one of the parameters' values for each processing target, separately from the recipes;
- and
- performing the recipe control process for multiple processing targets, and applying the correction coefficients to each processing target to adjust the at least one of the parameters' values.
An operation method of a processing system in which one processing that includes multiple processing operations is repeated multiple times and in which conditions of each processing operation are controlled by parameters, said method comprising:
- specifying a recipe that assigns values of the parameters to each processing operation in each processing run;
- specifying correction coefficients separately from the recipe, to correct for each processing run at least one of the parameters' values in at least one of the multiple processing operations to be repeated multiple times;
- and
- starting processing according to the recipe and applying the correction coefficients only in the processing runs where the recipe is performed.
An operation method of a processing comprising the steps of:
- specifying correction coefficients in advance, to correct for each processing run at least one of parameter values specifying processing conditions in the processing to be repeated multiple times;
- and
- starting the processing and applying the correction coefficients only in the processing runs where the processing is performed.
A method of depositing films on semiconductor substrates, comprising a step of depositing a film by using correction coefficients to correct, for each semiconductor substrate, a recipe specifying film deposition conditions.
A processing system in which one processing that includes multiple processes is repeated multiple times and in which the conditions of each process are controlled by parameters, said processing system comprising:
- a unit that specifies a recipe for assigning the parameters' values to each process in each processing run;
- a unit that specifies, separately from the recipe, correction coefficients to correct, for each processing run, at least one of the parameters' values in at least one of the processes among the multiple processes to be repeated multiple times;
- and
- a unit that starts the processing according to the recipe and applies the correction coefficients only in the processing runs in which the recipe is performed.
Dependencies are inferred from the claim text.