Single ic-chip design on wafer with an embedded sensor utilizing rf capabilities to enable real-time data transmission

An apparatus for real-time monitoring of process conditions of a semiconductor wafer processing operation comprising:

• a wafer processing tool adapted to receive and process a semiconductor wafer therein, said semiconductor wafer including one or more sensor devices embedded therein;
• a means for generating wireless electromagnetic signals for receipt by said embedded one or more sensor devices, said embedded sensor device generating sensory data in response to said electromagnetic signals,
• a transmitter means provided in said wafer for transmitting said sensory data;
• a receiver means located externally from said wafer processing tool for receiving said transmitted sensory data;
• and,
• a means for controlling processing conditions of the wafer process tool based upon the received sensory data.

A system for controlling processing condition parameters of a wafer processing chamber comprising:

• a means for generating RF signals for receipt by a monitoring wafer positioned within said chamber, said monitoring wafer having one or more embedded sensor circuits, each embedded sensor circuit comprising:
• a sensor device adapted for generating environmental parameter sensory data;
• an antenna device for receiving said RF signals;
• a means for converting received RF signals into voltage signals for input to a sensor device for activating said sensor device;
• a means for converting sensory data obtained from said embedded sensor device to digital signals;
• a means for storing said digital signals representing said sensory data;
• and,
• an RF transmitter means adapted for wirelessly transmitting said sensory data;
• a receiver means located externally from said wafer processing tool for receiving said transmitted sensory data;
• and,
• a processing means for calculating operating condition correction factors and operating range setpoints based upon said received sensory data;
• and,
• means for providing real-time adjusting of processing condition parameters in response to said correction factors and new operating range setpoints.