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US 2006/0234167 A1Published application
Semiconductor constructions
AssigneeMicron Technology, Inc.
InventorsTrung Doan, Terry Gilton
Life of this patent
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Abstract
The invention includes a process whereby a solvent is utilized to remove soluble portions of a resist, and subsequently the solvent can be removed with a gas-fortified liquid. In particular aspects, the gas-fortified liquid emits bubbles during the removal of the solvent. Additionally, the gas-fortified liquid can be utilized to remove residual resist scum, and in such aspects the gas-fortified liquid can emit bubbles during the scum removal.
Claims11
1-63. (canceled)
A semiconductor construction comprising:
- a semiconductive wafer;
- a photoresist supported by the wafer, the photoresist having a plurality of channels extending therein;
- and
- a liquid within the channels which is effervescing gas.
1 more element
Dependencies are inferred from the claim text.