Method for thermal development of a photosensitive element using an oriented development medium
OwnerMark Hackler, Anandkumar Kannurpatti +1inventors
InventorsMark Hackler, Anandkumar Kannurpatti, Sheila Weaver
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Abstract
The invention relates to a method for forming a relief pattern from a photosensitive element containing a composition layer capable of being partially liquefied by heating. Liquefied portions of the composition layer are removed by contact with a development medium having a predetermined directionality. The directionality of the development medium is oriented to increase peel strength of the development medium for removal of the development medium from the element.
Claims31
A method for forming a relief pattern from a photosensitive element having an exterior surface and containing a composition layer capable of being partially liquefied, comprising:
- heating the exterior surface to a temperature sufficient to cause a portion of the layer to liquefy;
- and
- contacting a development medium having a predetermined directionality to the exterior surface;
- wherein the contacting step is performed by orienting the directionality of the development medium to increase peel strength of the development medium while removing the development medium from the exterior surface.
Dependencies are inferred from the claim text.