Method and device for checking lithography data
AssigneeMicron Technology, Inc.
InventorsHusayn Alvarez-Gomariz, John Futrell
Life of this patent
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Abstract
Devices and methods are provided that include advantages such as the ability to identify sizes, shapes and locations of frequently unwanted additional features that occur as a result of photolithographic interference. The additional feature information is obtained through use of simulation methods with reduced processing time or solving a system of equations. This allows a user to quickly find information about additional feature printing before the features are printed, and before the reticle is made.
Claims28
A method of forming a reticle, comprising:
- organizing data into a two dimensional pattern of features;
- checking the data, including:
- identification of a number of first regions within the pattern, the first regions being spaced apart from each of a number of features in the pattern;
- identification of a number of second regions where the first regions overlap;
- organizing data into at least one modifying feature located in two dimensions over a portion of at least one of the number of second regions;
- and
- printing the two dimensional pattern of features and the at least one modifying feature onto a reticle substrate.
A method of checking data in a two dimensional pattern, comprising:
- identification of a number of first regions within the pattern that surround the number of features in the pattern;
- identification of a number of second regions where the first regions overlap;
- and
- analyzing optical behavior within the number of second regions to predict optical interactions.
A method of forming a reticle, comprising:
- organizing data into a two dimensional pattern of features;
- checking the data, including:
- identification of a number of first regions within the pattern that surround the number of features in the pattern;
- identification of a number of second regions where the first regions overlap;
- analyzing optical behavior within number of second regions to identify interaction regions;
- organizing data into at least one modifying feature located within at least one interaction region;
- and
- printing the two dimensional pattern of features and the at least one modifying feature onto a reticle substrate.
A machine-readable medium with instructions stored thereon, the instructions when executed operable to cause:
- identification of a number of first regions within the pattern that surround the number of features in the pattern;
- identification of a number of second regions where the first regions overlap;
- and
- analyzing of optical behavior within the second regions to predict optical interactions.
A method of forming a reticle, comprising:
- organizing data into a two dimensional pattern of features to form semiconductor components;
- checking the data, including:
- identification of a number of first regions within the pattern, each first regions being larger than the feature, spaced up by a distance from each of a number of features in the pattern;
- identification of a number of second regions where the first regions overlap;
- organizing data into at least one modifying feature located in two dimensions over a portion of at least one of the number of second regions;
- and
- printing the two dimensional pattern of features and the at least one modifying feature onto a reticle substrate.
Dependencies are inferred from the claim text.