Lithographic apparatus and device manufacturing method

A lithographic apparatus, comprising:

• a substrate table configured to hold a substrate;
• a projection system configured to project a patterned beam of radiation onto a target portion of the substrate;
• and
• a liquid supply system configured to at least partly fill a space between the projection system and the substrate table, with a liquid through which the beam is to be projected, the liquid supply system comprising a liquid confinement structure extending along at least a part of the boundary of the space between the projection system and the substrate table, the liquid confinement structure, comprising:
• a first gas inlet configured to supply gas at pressure to a space between the liquid confinement structure and the substrate table, and a second gas inlet configured to supply gas at pressure to a space between the liquid confinement structure and the substrate table, the second gas inlet located radially outward, relative to an optical axis of the projection system, of the first gas inlet.

A lithographic apparatus, comprising:

• a substrate table configured to hold a substrate;
• a projection system configured to project a patterned beam of radiation onto a target portion of the substrate;
• and
• a liquid supply system configured to at least partly fill a space between the projection system and the substrate table, with a liquid through which the beam is to be projected, the liquid supply system including a liquid confinement structure, comprising:
• first and second gas knives in series along the liquid confinement structure and configured to supply high pressure gas so as to at least partly contain the liquid in the space, and an outlet configured to remove gas from between the first gas knife and the second gas knife.

A device manufacturing method, comprising:

• projecting, using a projection system, a patterned beam of radiation through liquid onto a target portion of a substrate;
• at least partly confining the liquid to a space between the projection system and a substrate table holding the substrate using a liquid confinement structure extending along at least a part of the boundary of the space;
• supplying gas at pressure to a space between the liquid confinement structure and the substrate table through a first gas inlet;
• and
• supplying gas at pressure to a space between the liquid confinement structure and the substrate table through a second gas inlet, the second gas inlet located radially outward, relative to an optical axis of the projection system, of the first gas inlet.