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US 2006/0232755 A1Published application
Imaging system and method employing beam folding
AssigneeMassachusetts Institute of Technology
InventorsRajesh Menon, Henry Smith
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AssigneeMassachusetts Institute of Technology
InventorsRajesh Menon, Henry Smith
Estimating the term…
A maskless lithography system is disclosed that includes a spatial light modulator, first and second imaging areas, and first folding optics. The spatial light modulator receives illumination from an illumination source and provides a modulated illumination beam having a first cross-sectional line length in a length-wise direction and a first cross-sectional width in a width-wise direction that is substantially smaller than said first cross-sectional length. The first imaging area receives a first portion of the modulated illumination beam. The first folding optics provides a second portion of the modulated illumination beam that is adjacent the first portion of the modulated illumination beam in the length-wise direction at a second imaging area that is not adjacent the first imaging area in the length-wise direction.
A maskless lithography system comprising a spatial light modulator that receives illumination from an illumination source and provides a modulated illumination beam having a first cross-sectional line length in a length-wise direction and a first cross-sectional width in a width-wise direction that is substantially smaller than said first cross-sectional length, a first imaging area for receiving a first portion of said modulated illumination beam, and first folding optics for providing a second portion of said modulated illumination beam that is adjacent said first portion of said modulated illumination beam in the length-wise direction at a second imaging area that is not adjacent said first imaging area in the length-wise direction.
A maskless lithography system comprising a spatial light modulator that receives illumination from an illumination source and provides a modulated illumination beam having a first cross-sectional line length in a length-wise direction and a first cross-sectional width in a width-wise direction that is substantially smaller than said first cross-sectional length, a first imaging area for receiving a first portion of said modulated illumination beam, and first folding optics for providing a second portion of said modulated illumination beam that is adjacent said first portion of said modulated illumination beam in the length-wise direction at a second imaging area that is adjacent said first imaging area in the width-wise direction.
A maskless lithography system comprising:
Dependencies are inferred from the claim text.