Modified susceptor for barrel reactor
AssigneeMEMC Electronic Materials, Inc.
InventorLance Hellwig
Life of this patent
Estimating the term…
Abstract
A susceptor for supporting wafers during an chemical vapor deposition process. The susceptor has recesses and orifices disposed in the recesses extending to a central passage of the susceptor. The susceptor has exhaust openings disposed in the top of the susceptor to allow gas from the central passage of the susceptor to exit out the openings. A baffle plate covers the exhaust openings and a vertical space is created between the baffle plate and the top of the susceptor to allow gas to exit from the central passage to outside the susceptor. The bottom of the susceptor also has exhaust openings disposed therein. These openings allow gas from the central passage to exit the susceptor.
Claims26
A susceptor for supporting wafers in a reaction chamber of a barrel reactor during a chemical vapor deposition process, the susceptor comprising:
- a body having a top, a bottom, a generally elongate central passage within the body extending between the top and bottom of the body, and plural wafer supporting faces directed generally laterally away from the central passage;
- plural recesses in each of the wafer supporting faces of the body having a rear surface, each recess being sized and shaped to receive and support a wafer so that when the wafer is received in one of the recesses a front surface of the wafer faces generally away from the rear surface for exposure to reactant gas inside the reaction chamber of the barrel reactor and a rear surface of the wafer is in a generally opposed relationship with the rear surface of the recess;
- and
- plural orifices in the rear surface of each recess extending to the central passage of the body such that each recess is in fluid communication with the central passage, the orifices being disposed generally adjacent the periphery of the rear surface of the recess, a center and corresponding adjacent area of the rear surface of the recess being substantially free of the orifices.
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A susceptor for supporting wafers in a reaction chamber of a barrel reactor during a chemical vapor deposition process, the susceptor comprising:
- a body having a top, a bottom, a generally elongate central passage within the body extending between the top and bottom of body, and a face directed laterally generally away from the central passage;
- plural recesses in the face of the body having a rear surface, each recess being sized and shaped to receive and support a wafer so that when the wafer is received within the recess a front surface of the wafer faces generally away from the rear surface for exposure to reactant gas inside the reaction chamber of the barrel reactor and a rear surface of the wafer is in a generally opposed relationship with the rear surface of the recess;
- at least one orifice in the rear surface of each recess extending to the central passage of the body such that each recess is in fluid communication with the central passage;
- an exhaust opening in the top of the body in communication with the central passage, said exhaust opening being adapted to exhaust gas from the central passage to outside the susceptor when the susceptor is secured to a hanger to lessen the gas pressure being exerted on the rear surface of the wafer when the wafer is received in the circular recess caused by expanding gas in the central passage passing through the orifice and into the recess.
A susceptor for supporting wafers in a reaction chamber of a barrel reactor during a chemical vapor deposition process, the susceptor comprising:
- a body having a top, a bottom, a generally elongate central passage within the body extending between the top and bottom of body, and a face directed laterally generally away from the central passage;
- a plurality of recesses in the face of the body having a rear surface, each recess being sized and shaped to receive and support a wafer so that when the wafer is received within the recess a front surface of the wafer faces generally away from the rear surface for exposure to reactant gas inside the reaction chamber of the barrel reactor and a rear surface of the wafer is in a generally opposed relationship with the rear surface of the recess;
- at least one orifice in the rear surface of each recess extending to the central passage of the body such that each recess is in fluid communication with the central passage, said orifice being angled in a direction such that the orifice intersects the rear surface of the recess at a location below where it intersects the central passage.
Dependencies are inferred from the claim text.