Exposure apparatus and parameter editing method
AssigneeCanon Kabushiki Kaisha
InventorSentaro Aihara
Life of this patent
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Abstract
An exposure apparatus for exposing a substrate to radiation based on parameters includes a display, an input device, and a processor configured to execute a program for editing the parameters. The processor is configured to cause, in accordance with the program, the display to display a first group of a first classification name for classifying the parameters, a second group of a second classification name for classifying the parameters, and contents of parameters corresponding to a combination of the first classification name and the second classification name selected by the input device.
Claims13
An exposure apparatus for exposing a substrate to radiation based on parameters, said apparatus comprising:
- a display;
- an input device;
- and
- a processor configured to execute a program for editing the parameters,
- wherein said processor is configured to cause, in accordance with the program, said display to display a first group of a first classification name for classifying the parameters, a second group of a second classification name for classifying the parameters, and contents of parameters corresponding to a combination of the first classification name and the second classification name selected by said input device.
An exposure apparatus for exposing a substrate to radiation based on parameters, said apparatus comprising;
- a display;
- an input device;
- and
- a processor configured to execute a program for editing the parameters,
- wherein said processor is configured to cause, in accordance with the program, said display to display, with respect to a first recipe to be executed by said apparatus, a content of a first parameter and a name of a group of a second parameter that is different from the first parameter, and configured to set, with respect to a second recipe that is different from the first recipe, a content of the group of the second parameter based on the name designated by said input device.
A method of editing parameters of an exposure apparatus, the exposure apparatus exposing a substrate to radiation based on the parameters, said method comprising steps of:
- causing a display to display a first group of a first classification name for classifying the parameters and a second group of a second classification name for classifying the parameters;
- and
- causing the display to display contents of parameters corresponding to a combination of the first classification name and the second classification name selected by an input device.
A method of editing parameters of an exposure apparatus, the exposure apparatus exposing a substrate to radiation based on the parameters, said method comprising steps of:
- causing a display to display, with respect to a first recipe to be executed by the apparatus, a content of a first parameter and a name of a group of a second parameter that is different from the first parameter;
- and
- setting, with respect to a second recipe that is different from the first recipe, a content of the group of the second parameter based on the name designated by an input device.
A computer-readable storage medium which stores software for executing a method of editing parameters of an exposure apparatus, the exposure apparatus exposing a substrate to radiation based on the parameters, said method comprising steps of:
- causing a display to display a first group of a first classification name for classifying the parameters and a second group of a second classification name for classifying the parameters;
- and
- causing the display to display contents of parameters corresponding to a combination of the first classification name and the second classification name selected by an input device.
A computer-readable storage medium which stores software for executing a method of editing parameters of an exposure apparatus, the exposure apparatus exposing a substrate to radiation based on the parameters, said method comprising steps of:
- causing a display to display, with respect to a first recipe to be executed by the apparatus, a content of a first parameter and a name of a group of a second parameter that is different from the first parameter;
- and
- setting, with respect to a second recipe that is different from the first recipe, a content of the group of the second parameter based on the name designated by an input device.
Dependencies are inferred from the claim text.