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US 2006/0223202 A1Published application
Offline screening of outgas emissions in semiconductor processing
AssigneeIntel Corporation
InventorsHok-Kin Choi, Vani Thirumala
Life of this patent
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Abstract
The present description relates to measuring outgas emissions in fabrication chambers used for semiconductors, micromachines and the like. In one embodiment, the invention includes inserting a gas adsorption material into a processing chamber exhaust vent, running a process in the chamber, venting gasses in the chamber through the gas adsorption material, removing the adsorption material from the exhaust vent, and analyzing the adsorption material for gases.
Claims19
A method comprising:
- inserting a gas adsorption material into a processing chamber exhaust vent;
- running a process in the chamber;
- venting gasses in the chamber through the gas adsorption material;
- removing the adsorption material from the exhaust vent;
- and
- analyzing the adsorption material for gases.
3 more elements
A method comprising:
- flow conditioning an adsorption sampling device;
- exposing the sampling device to processing chamber gases at a first location;
- analyzing the gases adsorbed by the sampling device at a second location.
An apparatus comprising:
- an exhaust vent to conduct purge gasses from a fabrication chamber;
- an adsorption tube removably coupled to the exhaust vent, the adsorption tube having an adsorption sampling material and an inner passageway to conduct the purge gasses through the adsorption material.
Dependencies are inferred from the claim text.