Method for manufacturing photomask and method for manufacturing semiconductor device using photomask

A manufacturing method for a photomask based on design data indicating plurality of first figure elements comprising the steps of;

• extracting first data from the design data indicating a first figure element;
• forming a first figure element group including the first figure element and first figure elements affecting the first figure element due to the optical proximity effect;
• assigning identical identification data to a identical first data group indicating the first figure element group;
• estimating a influence of an optical proximity effect on the first figure element group;
• generating second data indicating a second figure element for compensating the influence of the optical proximity effect on the first figure element group;
• configuring figure data indicating plurality of second figure elements by assigning identical second data to the identical first data being included in the identical first data group with the identical identification data;
• and
• forming photomask patterns on the photomask using the figure data.

A manufacturing method for a photomask based on design data indicating plurality of first figure elements comprising the steps of;

• extracting first data from design data indicating a first figure element;
• assigning identical first identification data to a identical first data indicating the identical shape of first figure element;
• establishing a region based on the first figure element;
• recognizing a first figure element group in the region by the identical first identification data;
• configuring a first data group indicating the first figure element group being in the region;
• assigning identical second identification data to a identical first data group;
• estimating a influence of an optical proximity effect on the first figure element group;
• generating second data indicating a second figure element for compensating the influence of the optical proximity effect on the first figure element group;
• configuring figure data indicating plurality of second figure elements by assigning identical second data to the identical first data being included in the identical first data group in the region, the identical first data group having identical second identification data;
• forming photomask patterns on the photomask using the figure data.

A manufacturing method for a photomask based on design data indicating plurality of a sides of a first figure element comprising the steps of;

• extracting first data from the design data indicating a side of a first figure element;
• assigning identical first identification data to identical first data indicating a side of a first figure element;
• configuring a side group from the side of a first FIG. element and sides of a first figure element in a constant distance of the side of a first figure element;
• assigning identical second identification data to the identical side data group indicating a side group;
• estimating a influence of an optical proximity effect on the side group;
• generating second data indicating a side of a second figure element for compensating the influence of the optical proximity effect on the side group;
• configuring figure data indicating plurality of a side of a second figure element by assigning identical second data to the first data, the first data having identical side data group with identical second identification data;
• and
• forming photomask patterns on the photomask from on the figure data.

An apparatus for performing a manufacturing method for photomask comprising;

• an unit for extracting first data from design data indicating first figure element;
• an unit for forming a first element group including the first figure element and first figure elements in a constant distance of the first figure element;
• an unit for assigning identical identification data to a identical first data group indicating the first figure element group;
• an unit for estimating a influence of an optical proximity effect on the first figure element group;
• an unit for generating second data indicating a second figure element for compensating the influence of the optical proximity effect on the first figure element group;
• an unit for configuring figure data indicating plurality of second figure elements by assigning identical second data to the identical first data being included in the identical first data group with the identical identification data;
• and
• forming photomask patterns on the photomask using the figure data.

An apparatus for performing a manufacturing method for photomask comprising;

• an unit for extracting first data from the design data indicating a side of a first figure element;
• an unit for assigning identical first identification data to identical first data indicating a side of a first figure element;
• an unit for configuring a side group from the side of a first figure element and sides of a first figure element in a constant distance of the side of a first figure element;
• an unit for assigning identical second identification data to the identical side data group indicating a side group;
• an unit for estimating a influence of an optical proximity effect on the side group;
• an unit for generating second data indicating a side of a second figure element for compensating the influence of the optical proximity effect on the side group;
• an unit for configuring figure data indicating plurality of a side of a second figure element by assigning identical second data to the first data, the first data having identical side data group with identical second identification data;
• and
• an unit for forming photomask patterns on the photomask from on the figure data.