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US 2006/0222768 A1Published application
Method and system for precursor delivery
AssigneeTokyo Electron Limited
InventorJacques Faguet
Life of this patent
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Abstract
A method for precursor delivery includes transferring a precursor vapor from a precursor vaporization system to an intermediate precursor chamber, collecting the precursor vapor in the intermediate precursor chamber, flowing a process gas containing the collected precursor vapor to a process chamber, and exposing a substrate in the process chamber to the process gas to deposit a layer including at least one element from the precursor vapor on the substrate.
Claims22
A method for precursor delivery in a deposition system, the method comprising:
- transferring a precursor vapor from a precursor vaporization system to an intermediate precursor chamber;
- collecting the precursor vapor in the intermediate precursor chamber;
- flowing a process gas containing the collected precursor vapor to a process chamber;
- and
- exposing a substrate in the process chamber to the process gas to deposit a layer including at least one element from the precursor vapor on the substrate.
2 more elements
A deposition system, comprising:
- means for transferring a precursor vapor from a precursor vaporization system to an intermediate precursor chamber;
- means for collecting the precursor vapor in the intermediate precursor chamber;
- means for flowing a process gas containing the collected precursor vapor to a process chamber;
- and
- means for exposing a substrate in the process chamber to the process gas.
2 more elements
A deposition system, comprising:
- a process chamber;
- a precursor vaporization system configured to produce a precursor vapor;
- an intermediate precursor chamber coupling the precursor vaporization system in fluid communication with the process chamber, the intermediate precursor chamber having an interior surface configured to collect the precursor vapor received from the precursor vaporization system and configured to release the precursor vapor for transfer to the process chamber;
- and
- a controller operatively coupled with the intermediate precursor chamber, the controller configured to regulate the collection and release of the precursor vapor from the interior surface of the intermediate precursor chamber.
2 more elements
Dependencies are inferred from the claim text.