Exposure system and exposure method
AssigneeCanon Kabushiki Kaisha
InventorsKinya Yamaguchi, Yuichi Takamura
Life of this patent
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Abstract
An exposure system for exposing a substrate to radiation is disclosed. The system comprises an exposure unit configured to expose the substrate to radiation, an exposure chamber configured to accommodate the exposure unit, an alignment measurement unit arranged outside the exposure chamber and configured to measure a position of an alignment mark on the substrate, and a load-lock chamber arranged between the exposure chamber and the alignment measurement unit.
Claims11
An exposure system for exposing a substrate to radiation, said system comprising:
- an exposure unit configured to expose the substrate to radiation;
- an exposure chamber configured to accommodate said exposure unit;
- an alignment measurement unit arranged outside said exposure chamber and configured to measure a position of an alignment mark on the substrate;
- and
- a load-lock chamber arranged between said exposure chamber and said alignment measurement unit.
An exposure method of exposing a substrate to radiation, said method comprising steps of:
- performing, using an alignment measurement unit, first measurement of a position of an alignment mark on the substrate, outside an exposure chamber which accommodates an exposure unit configured to expose the substrate to radiation;
- conveying the substrate, for which the first measurement has been performed, into the exposure chamber through a load-lock chamber;
- aligning, in the exposure chamber, the conveyed substrate based on the first measurement;
- and
- exposing, in the exposure chamber, the aligned substrate to radiation using the exposure unit.
Dependencies are inferred from the claim text.