Lithographic apparatus, device manufacturing method, and device manufactured thereby
AssigneeASML Netherlands B.V.
InventorsJohannes Wilhelmus Jacobs, Barrie Brewster, Robert Livesey
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Abstract
A lithographic apparatus includes a patterning device for patterning a beam of radiation, a projection system for projecting the patterned beam of radiation onto a substrate, a gas purged sealing aperture extending between different zones of the apparatus, and a gas supply arrangement for supplying a mixture of at least argon and hydrogen to the sealing aperture.
Claims38
A lithographic apparatus comprising:
- a patterning device for patterning a beam of radiation;
- a projection system for projecting the patterned beam of radiation onto a substrate;
- a gas purged sealing aperture extending between different zones of the apparatus;
- and
- a gas supply arrangement for supplying a mixture of at least argon and hydrogen to the sealing aperture.
A seal of a lithographic apparatus, the seal comprising a gas purged sealing aperture extending between two zones of the apparatus, wherein the seal is provided with at least one gas supply arrangement configured to supply a mixture containing substantially argon and hydrogen to the sealing aperture.
A lithographic apparatus comprising:
- a fluid passage extending between at least two separate zones of the apparatus;
- and
- a gas supplying system configured to supply hydrogen gas and argon gas to said fluid passage.
A device manufacturing method comprising:
- projecting a patterned beam of radiation onto a substrate;
- sealing at least two zones within a lithographic apparatus from each other with at least one gas purged sealing aperture;
- and
- purging said sealing aperture with a mixture of at least argon and hydrogen.
Dependencies are inferred from the claim text.