Method for detecting the inclined status of hot plate
OwnerMing-Jen Chenginventor
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Abstract
A method for detecting the inclined status of a hot plate comprising selecting a sensitive photoresist coated on a wafer. A first wafer is positioned on a standard hot plate to perform a bake treatment. A stepping exposure with gradually changing light intensity is performed to obtain the minimum exposure energy of the thickness of the first photoresist layer. A second photoresist layer the same as the first wafer is coated on the surface of the second wafer, and positioned on a hot plate under test to perform a bake treatment. The second photoresist layer is exposed by a minimum exposure energy, thereby having the first photoresist layer being uniformly exposed or not to determine whether the hot plate under test is inclined or not.
Claims8
A method for detecting inclined status of a hot plate, comprising:
- providing a first wafer;
- coating a first photoresist layer on the surface of the first wafer;
- positioning the first wafer on a hot plate under test to perform a first bake treatment;
- and
- performing an exposure on the first photoresist layer by an exposure threshold energy of a thickness of the photoresist layer, thereby having the first photoresist layer being uniformly exposed or not to determine whether the hot plate under test is inclined or not.
Dependencies are inferred from the claim text.