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US 2006/0219659 A1Published application
Method for treatment of silicon-based target object to be processed, apparatus for treatment and method of manufacturing semiconductor device
OwnerTakeshi Yamauchiinventor
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Abstract
Disclosed is a method for the treatment of a silicon-based target object to be processed, comprising the steps of exposing the silicon-based target object to a plasma atmosphere containing oxygen radicals, and applying a DC voltage to the silicon-based target object via a resistance element in an atmosphere of the plasma so as to oxidize the target object.
Claims21
A method for a treatment of a silicon-based target object to be processed, comprising:
- exposing the silicon-based target object to a plasma atmosphere containing oxygen radicals;
- and
- applying a DC voltage to the silicon-based target object via a resistance element in an atmosphere of the plasma so as to oxidize the target object.
An apparatus for performing a treatment, comprising:
- a process chamber;
- a holder arranged within the process chamber for holding a silicon-based target object;
- means for generating a plasma containing oxygen radicals within the process chamber;
- a DC power source for supplying a DC voltage to the target object;
- and
- a resistance element arranged between the target object and the DC power source.
3 more elements
A method for manufacturing a semiconductor device, comprising:
- exposing a silicon substrate having a protruding portion to a plasma containing oxygen radicals;
- and
- applying a DC voltage to the substrate via a resistance element in an atmosphere of the plasma so as to carry out the oxidizing treatment of the substrate, thereby forming oxide films on the side surface and the upper surface of the protruding portion and around the protruding portion such that the oxide film formed on the side surface of the protruding portion is thinner than any of the oxide films formed on the upper surface of the protruding portion and around the protruding portion.
Dependencies are inferred from the claim text.