Magnet arrangement for a planar magnetron
AssigneeApplied Materials, Inc.
InventorsThomas Deppisch, Andreas Lopp
Life of this patent
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Abstract
A magnetic arrangement for a planar magnetron, in which an initial magnetic pole encompasses a second magnetic pole. This magnetic arrangement is moved linear in longitudinal direction to a target by a specific value and then moved back in opposite direction by the same value. In one version, an additional perpendicular motion is effected. The magnet arrangement is designed so that north and south pole interlock and waviform racetracks are generated. This enables constant sputtering from the entire target surface.
Claims31
1-25. (canceled)
A magnet arrangement for a planar magnetron in which an initial magnetic pole, designed as a rectangular frame, comprises a second magnetic pole designed as a linear bar and in which the linear bar has several perpendicular arms on its longitudinal axis, wherein two arms each are provided for at the ends of the bar, which are located at an angle (α) of approximately 60° to the longitudinal axis of the bar.
A magnet arrangement for a planar magnetron, in which an initial magnetic pole encompasses a second magnetic pole and the second magnetic pole has a first group of arms which are oriented in an initial direction, as well as a second group of arms which are oriented in a direction opposite to the initial direction, wherein the longitudinal axis of the first group of arms is offset against the longitudinal axis of the second group of arms so that the longitudinal axis of an arm of the first group is located between the longitudinal axes of two arms of the second group.
The magnet arrangement of clam 32, wherein the magnetic arrangement can be moved relative to a target.
Dependencies are inferred from the claim text.