Substrate processing apparatus

A substrate processing apparatus that performs a processing of a substrate, comprising:

• a processing bath that can store a processing solution and contain a substrate;
• an external bath that is disposed outside of the processing bath and recovers the processing solution overflowing the processing bath;
• a processing solution supplying part that supplies the processing solution to the external bath;
• common piping that is used to discharge the processing solution from the external bath;
• first piping that is connected to the common piping and supplies to the processing bath the processing solution discharged via the common piping;
• second piping that is connected to the common piping and supplies to the processing bath the processing solution discharged via the common piping;
• a switching part that performs switching of a flow of the processing solution between the first piping and the second piping;
• a temperature controller that is disposed on the common piping and controls a temperature of the processing solution flowing through the common piping;
• a filter disposed on the second piping;
• a storage amount detecting part that detects an amount of storage of the processing solution stored in the external bath;
• and
• a controller that, when an amount of storage of the processing solution detected by the storage amount detecting part is not greater than a predetermined amount, controls the switching part so that the processing solution is supplied from the common piping to the processing bath via the first piping, while causing the temperature controller to heat the processing solution, and that, when an amount of storage of a processing solution detected by the storage amount detecting part exceeds a predetermined value, controls the switching part so that the processing solution is supplied from the common piping to the processing bath via the second piping, while causing the temperature controller to heat the processing solution.

A substrate processing apparatus that performs a processing of a substrate, comprising:

• a processing bath that can store a processing solution and contain a substrate;
• an external bath that is disposed outside of the processing bath and recovers the processing solution overflowing the processing bath;
• a processing solution supplying part that supplies the processing solution to the external bath;
• a supply amount measuring part that measures an amount of supply of the processing solution supplied from the processing solution supplying part to the processing bath;
• common piping that is used to discharge the processing solution from the external bath;
• first piping that is connected to the common piping and supplies to the processing bath the processing solution discharged via the common piping;
• second piping that is connected to the common piping and supplies to the processing bath the processing solution discharged via the common piping;
• a switching part that performs switching of a flow of the processing solution between the first piping and the second piping;
• a temperature controller that is disposed on the common piping and controls a temperature of the processing solution flowing through the common piping;
• a filter disposed on the second piping;
• and
• a controller that, when an amount of supply of the processing solution measured by the supply amount measuring part is not greater than a predetermined amount, controls the switching part so that the processing solution is supplied from the common piping to the processing bath via the first piping, while causing the temperature controller to heat the processing solution, and that, when an amount of supply of the processing solution measured by the supply amount measuring part exceeds a predetermined value, controls the switching part so that the processing solution is supplied from the common piping to the processing bath via the second piping, while causing the temperature controller to heat the processing solution.