PVD equipment and electrode and deposition ring thereof
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYu-Yuan Kuo, Shuo-Yen Tai, Chou-Ting Tsai, Ming-Te More, Kuo-Hsien Cheng, G. H. Tseng
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYu-Yuan Kuo, Shuo-Yen Tai, Chou-Ting Tsai, Ming-Te More, Kuo-Hsien Cheng, G. H. Tseng
Estimating the term…
A deposition ring comprises a ring body, a groove and a protrusion structure. The ring body is planar-ring shaped, and comprises a first surface. The groove and the protrusion structure are ring shaped and formed on the first surface. The protrusion structure is close to the groove and near an outer side of the ring body. The groove comprises a first side wall, a second side wall and a bottom. A curvature radius of the first side wall is larger than a curvature radius of the second side wall. The second side wall is a continuous ring shaped wall. The bottom is formed between the first side wall and the second side wall.
A deposition ring, comprising:
A PVD electrode, comprising:
A PVD equipment, comprising:
Dependencies are inferred from the claim text.