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US 2006/0216839 A1Published application
Method for monitoring chamber cleanliness
AssigneeApplied Materials Israel Ltd.
InventorsDror Shemesh, Michal Eilon, Hen Doozli, Ekaterina Rechav, Eitan Binyamini
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Abstract
A method for evaluating a cleanliness of a tool, the method includes: receiving a wafer; cleaning the wafer; placing the wafer into the tool for a predefined period; removing the wafer from the tool, performing a contact angle measurement and determining the cleanliness of the wafer.
Claims12
A method for evaluating a cleanliness of a tool, the method comprises:
- receiving a wafer;
- cleaning the wafer;
- placing the wafer into the tool for a predefined period;
- removing the wafer from the tool, performing a contact angle measurement and determining the cleanliness of the wafer.
1 more element
Dependencies are inferred from the claim text.