Reduced pitch multiple exposure process
AssigneeASML Netherlands B.V.
InventorsTheodore Paxton, Steven Hansen, Cassandra Owen, Todd Davis, Todd Hiar, James Hunter
Life of this patent
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Abstract
A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.
Claims25
A device manufacturing method for providing a desired pattern of features on a surface of a substrate comprising:
- coating the surface of the substrate with a developable material layer;
- coating a first resist layer on top of the developable material layer;
- exposing the first resist layer to an image of a first pattern;
- developing the first resist layer and the developable material layer to provide the developable material layer with a first target pattern;
- removing the first resist layer;
- coating a second resist layer on top of the developable material layer;
- exposing the second resist layer to an image of a second pattern;
- and
- developing the second resist layer and the developable material layer to provide the developable material layer with a second target pattern,
- wherein the first and second target patterns produce the desired pattern in the developable material layer.
A device manufacturing method for providing a desired pattern of features on a surface of a substrate comprising:
- coating the surface of the substrate with a developable material layer;
- coating a first resist layer on top of the developable material layer;
- exposing the first resist layer to an image of a first pattern;
- developing the first resist layer and the developable material layer to provide the developable material layer with a first target pattern;
- removing the first resist layer;
- fixing the developable material layer provided with the first target pattern;
- supplying a supplementary developable material layer to fill voids of the first target pattern of the developable material layer;
- coating a second resist layer on top of the supplementary developable material layer;
- exposing the second resist layer to an image of a second pattern;
- and
- developing the second resist layer and the supplementary developable material layer to provide the supplementary developable material layer with a second target pattern,
- wherein the first and second target patterns produce the desired pattern on the surface of the substrate.
A device manufacturing method for providing a target pattern of features on a surface of a substrate comprising:
- coating the surface of the substrate with a developable material layer;
- coating a resist layer on top of the developable material layer;
- exposing the resist layer to an image of a pattern;
- and
- developing the resist layer and the developable material layer to provide the developable material layer with the target pattern, wherein a desired pattern of features on the surface of the substrate includes the target pattern and a supplementary target pattern of features on the surface of the substrate.
Dependencies are inferred from the claim text.