Exposure apparatus and method, and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorTomohiro Harayama
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Abstract
An exposure apparatus which includes a projection optical system configured to project a pattern of a reticle onto a substrate and exposes the substrate to light via the reticle and the projection optical system with a gap between the projection optical system and the substrate filled with liquid, comprises a liquid immersion system configured to supply the liquid to the gap and to recover the liquid from the gap; and a generator configured to generate at least one of an electric field and magnetic field in a path of the liquid of the liquid immersion system.
Claims10
An exposure apparatus which includes a projection optical system configured to project a pattern of a reticle onto a substrate and exposes the substrate to light via the reticle and the projection optical system with a gap between said projection optical system and the substrate filled with liquid, said apparatus comprising:
- a liquid immersion system configured to supply the liquid to the gap and to recover the liquid from the gap;
- and
- a generator configured to generate at least one of an electric field and magnetic field in a path of the liquid of said liquid immersion system.
A method of exposing a substrate to light via a reticle and a projection optical system configured to project a pattern of the reticle onto the substrate with a gap between the projection optical system and the substrate filled with liquid, said method comprising:
- an immersion step of supplying the liquid to the gap and recovering the liquid from the gap;
- and
- a generation step of generating at least one of an electric field and magnetic field in a path of the liquid, the path being formed in said immersion step.
Dependencies are inferred from the claim text.