Method for preparing photosensitive aqueous developable coating composition
OwnerJeong Moon, Yeong Kiminventors
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Abstract
A method for preparing a photosensitive aqueous developable coating composition is disclosed. The method does not involve a step of drying, pulverizing, and re-dissolving a solid polymer when preparing the coating composition. In addition, dilution of a polymerization solution by a solvent and a separate process for adjusting the viscosity of the polymerization solution are not needed. Therefore, the process for preparing the compositions can be simplified and undercut problems of a patterned edge during development and subsequent edge curl problems after a firing process can be overcome.
Claims20
A method of preparing a photolithographically developable composition, comprising:
- preparing a polymer solution by polymerizing a polymerizable compound in a solvent, the polymer solution comprising a polymer dissolved in the solvent;
- and
- mixing to the polymer solution a photosensitive material and one or more material selected from the group consisting of conductive particles and glass frit, thereby forming a photolithographically developable composition;
- wherein preparing the polymer solution does not comprise:
- pulverizing said polymer into smaller polymer pieces, and
- dissolving said polymer pieces in said solvent.
Dependencies are inferred from the claim text.