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US 2006/0216615 A1Published application
Wavefront engineering with off-focus mask features
OwnerMichael Goldstein, John Uratainventors
Life of this patent
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Abstract
An imaging part such as a mask or reticle includes a patterned layer in an on-axis plane of the imaging part. The imaging part further includes another layer including sub-resolution features, where the another layer is positioned in an off-axis plane of the imaging part.
Claims20
An imaging part comprising:
- a patterned layer including a plurality of features of a size which can be printed, the patterned layer positioned in an on-axis plane of the imaging part;
- and
- another layer, the another layer including a plurality of sub resolution features and positioned in an off-axis plane of the imaging part.
A method comprising:
- forming a first layer on an imaging part substrate;
- patterning the first layer;
- forming a second layer proximate to the first layer;
- and
- patterning the second layer;
- wherein one of the first layer and the second layer is an on-axis layer including features to be printed on a device substrate, and wherein the other of the first layer and the second layer is an off-axis layer including sub-resolution features positioned relative to a corresponding feature to be printed on a device substrate.
3 more elements
A system comprising:
- an imaging part, the imaging part including:
- a patterned layer including a plurality of features of a size which can be printed, the patterned layer positioned in an on-axis plane of the imaging part;
- and
- another layer, the another layer including a plurality of sub resolution features and positioned in an off-axis plane of the imaging part;
- and
- a light source positioned to transmit light through the imaging part.
3 more elements
Dependencies are inferred from the claim text.