Method of mask making and structure thereof for improving mask ESD immunity

Abstract

A method for fabricating a mask (or reticle) to improve the mask ESD immunity is provided. A substrate having an upper surface is substantially transparent to a selected radiation. A light sensitive layer is formed over the substrate. The light sensitive layer is patterned and etched to form a pattern of openings in the light sensitive layer. The substrate is etched according to the pattern of openings in the light sensitive layer. The light sensitive layer is stripped. An opaque layer is then deposited on the upper surface and in the openings of the patterned substrate. The substrate is planarized by removing excess opaque layer from over the upper surface of the substrate. A pellicle is then mounted outstretched on the upper surface of the substrate.

Dependencies are inferred from the claim text.