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US 2006/0215146 A1Published application
Exposure process and apparatus using glass photomasks
AssigneeFujitsu Hitachi Plasma Display Limited
InventorsMasashi Nishiki, Hisashi Okada
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Abstract
An exposure process using photomasks, the process includes the steps of: providing a plurality of glass photomasks for optical lithography with respect to a target substrate to be processed, the photomasks having identical exposure patterns, and exposing the target substrate a plurality of times using the plurality of glass photomasks.
Claims8
An exposure process using photomasks, the process comprising the steps of:
- providing a plurality of glass photomasks for optical lithography with respect to a target substrate to be processed, the photomasks having identical exposure patterns, and
- exposing the target substrate a plurality of times using the plurality of glass photomasks.
An exposure apparatus comprising:
- a supporter for supporting a plurality of glass photomasks for optical lithography;
- a mount for mounting a target substrate to be processed;
- a moving unit for moving the supporter and the mount relative to each other;
- a light source for exposing the substrate through one of the photomasks when the photomask faces the substrate;
- and
- a controller for controlling the moving unit and the light source,
- wherein the plurality of glass photomasks have identical exposure patterns and the target substrate is exposed a plurality of times using the plurality of glass photomasks.
4 more elements
Dependencies are inferred from the claim text.