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US 2006/0215142 A1Published application
Lithographic apparatus and device manufacturing method utilizing dynamic correction for magnification and position in maskless lithography
AssigneeASML Netherlands B.V.
InventorsPieter Willem De Jager, Theodorus Van Den Akker, Willem Venema, Wouter Mulckhuyse, Lambertus Gerardus Kessels
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Abstract
A lithographic apparatus in which a size and/or a position of features formed on a substrate are adjusted by adjusting an intensity of radiation at boundaries of pattern features.
Claims19
A lithographic apparatus, comprising:
- an illumination system that conditions a radiation beam;
- an array of individually controllable elements that modulate the radiation beam;
- a projection system that projects the modulated beam onto a target portion of a substrate;
- and
- a pattern controller that provides control signals to the array of individually controllable elements, such that the radiation beam is modulated to generate a desired pattern and dose profile on the substrate, wherein the pattern controller comprises a pattern adjuster that adjusts at least one of a size and a position, relative to the substrate, of at least a part of the pattern generated on the substrate by adjusting radiation intensity of at least a part of the modulated beam.
2 more elements
A device manufacturing method, comprising:
- projecting a beam of radiation that is modulated by an array of individually controllable elements onto a substrate;
- providing control signals to the array of individually controllable elements, such that the radiation beam is modulated to generate a desired pattern and dose profile on the substrate;
- and
- adjusting at least one of a size and a position, relative to the substrate, of at least a part of the pattern generated on the substrate by adjusting an intensity of at least a part of the modulated beam.
1 more element
Dependencies are inferred from the claim text.