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US 2006/0215141 A1Published application
Lithographic apparatus and method for its use
AssigneeASML Netherlands B.V.
InventorMarinus Van Dam
Life of this patent
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Abstract
An apparatus and method for imaging a pattern onto a substrate is described. A recipe for producing an image includes optional tool-type information. Where tool-type information indicates that the recipe pertains to a different tool type, the apparatus makes adjustments to its imaging settings in order to emulate performance of the different tool type.
Claims21
A lithographic apparatus comprising:
- an illumination system configured to condition a radiation beam;
- a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
- a substrate table constructed to hold a substrate;
- a projection system configured to project the patterned radiation beam onto a target portion of the substrate;
- and
- a control system, configured to allow the setting of a plurality of machine parameters for an imaging process, checking the plurality of machine parameters to determine the presence or absence of a tool type parameter, and if a tool type parameter is present, controlling the lithographic apparatus to change a contrast of the lithographic apparatus, in accordance with a tool type indicated by the tool type parameter.
3 more elements
A device manufacturing method using a lithographic apparatus comprising:
- setting a plurality of machine parameters for an imaging process;
- checking the plurality of machine parameters to determine the presence or absence of a tool type parameter;
- if a tool type parameter is present, adapting a contrast setting in accordance with a tool type indicated by the tool type parameter;
- projecting a patterned beam of radiation onto a layer of radiation sensitive material on a substrate using the machine parameters.
1 more element
A machine readable medium having machine executable instructions for performing a device manufacturing method using a lithographic apparatus comprising:
- setting a plurality of machine parameters for an imaging process;
- checking the plurality of machine parameters to determine the presence or absence of a tool type parameter;
- if a tool type parameter is present, adapting a contrast setting in accordance with a tool type indicated by the tool type parameter;
- projecting a patterned beam of radiation onto a layer of radiation sensitive material on a substrate using the machine parameters.
1 more element
Dependencies are inferred from the claim text.