Back to results
US 2006/0215138 A1Published application
Laser beam pattern generator with a two-axis scan mirror
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorXinbing Liu
Life of this patent
Estimating the term…
Loading patent…
Loading patent…
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorXinbing Liu
Estimating the term…
An optical pattern generator for use in grayscale photolithography is provided with an optical source to generate a light beam, an optical modulator optically coupled to the optical source to modulate the power of the light beam, a two dimensional scanning mirror optically coupled to the optical modulator to reflect the light beam, a lens optically coupled to the two dimensional scanning mirror for focusing the reflected light beam to a beam spot on a surface of a substrate coated with photoresist, and control means electrically coupled to the two dimensional scanning mirror to control a tilt of the two dimensional scanning mirror about two substantially orthogonal axes to scan the beam spot over a surface of the substrate in two substantially orthogonal dimensions with sub-micron accuracy.
An optical pattern generator for use in grayscale photolithography, comprising:
A method of generating a grayscale pattern having sub-micron accuracy on a substrate coated with photoresist, the method comprising the steps of:
An optical pattern generator for use in grayscale photolithography comprising:
A method of generating a grayscale pattern on a substrate having a surface coated with photoresist comprising the steps of:
Dependencies are inferred from the claim text.