Exposure apparatus and device manufacturing method

Abstract

An exposure apparatus for exposing a substrate to light via a reticle in a vacuum atmosphere includes a projection optical system configured to project a pattern of the reticle onto the substrate; a stage configured to hold one of the reticle and the substrate and to move; first and second partitions configured to define an exhaust space between a first space which accommodates at least a part of the projection optical system and a stage space which accommodates the stage, the first partition including a first opening configured to make the light pass between the first space and the exhaust space, and the second partition including a second opening configured to make the light pass between the exhaust space and the stage space; a first supply system configured to supply fluid into the stage space; and a first exhaust system configured to recover fluid from the stage space through the second opening and the exhaust space.

Dependencies are inferred from the claim text.