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US 2006/0215136 A1Published application
Exposure apparatus and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorKazuki Fujimoto
Life of this patent
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Abstract
An exposure apparatus for exposing a substrate to light via a reticle includes a first plurality of optical elements configured to direct the light; a first vacuum chamber configured to accommodate said first plurality of optical elements; a first support configured to support said first vacuum chamber; and a second support configured to support at least one of said first plurality of optical elements substantially independently of said first support.
Claims13
An exposure apparatus for exposing a substrate to light via a reticle, said apparatus comprising:
- a first plurality of optical elements configured to direct the light;
- a first vacuum chamber configured to accommodate said first plurality of optical elements;
- a first support configured to support said first vacuum chamber;
- and
- a second support configured to support at least one of said first plurality of optical elements substantially independently of said first support.
2 more elements
Dependencies are inferred from the claim text.