Lithographic apparatus, immersion projection apparatus and device manufacturing method

An immersion projection apparatus to project a beam onto a substrate, comprising:

• a substrate table constructed to hold the substrate;
• a projection system configured to project a radiation beam onto a target portion of the substrate;
• a fluid supply system which is constructed to supply a fluid between the substrate and the projection system;
• and
• a position controller to control a position of the fluid supply system, a position quantity of the substrate being provided to the position controller,
• wherein the position controller is configured to:
• determine a desired position of the fluid supply system by adding a position offset to the position quantity of the substrate;
• and
• position the fluid supply system according to the desired position.

A device manufacturing method comprising:

• projecting by a projection system a patterned radiation beam onto a target portion of a substrate;
• supplying by a fluid supply system a fluid between the substrate and the projection system;
• and
• controlling a position of the fluid supply system, the controlling comprising obtaining a position quantity of the substrate and determining a desired position of the fluid supply system by adding a position offset to the position quantity of the substrate;
• and positioning the fluid supply system according to the desired position.