Exposure apparatus for flat panel display device and method of exposing using the same

A method of exposing using an exposure apparatus for a flat panel display device, comprising:

• preparing an exposure apparatus including:
• a light source;
• a stage having a horizontal support surface for disposing a substrate thereupon;
• a mask vertically arranged with respect to the horizontal support surface of the stage, the mask including a transmissive region and a shielded region;
• a frame surrounding an edge of the mask;
• and
• an optical system between the light source and the stage, the optical system that controls a direction of light from the light source through the mask to irradiate the light onto the stage;
• disposing the substrate on the stage, the substrate including a thin film and a photoresist layer on the thin film;
• and
• irradiating the light from the light source through the mask and via the optical system onto a portion of the photoresist layer on the substrate corresponding to the transmissive region.

A method for photolithography of a flat panel display device, comprising:

• sequentially forming a thin film and a photoresist layer on a substrate;
• preparing an exposure apparatus including:
• a light source;
• a stage having a horizontal support surface for disposing a substrate thereupon;
• a mask vertically arranged with respect to the horizontal support surface of the stage, the mask including a transmissive region and a shielded region;
• a frame surrounding an edge of the mask;
• and
• an optical system between the light source and the stage, the optical system that controls a direction, of light from the light source through the mask to irradiate the light onto the stage;
• disposing the substrate on the stage;
• irradiating the light from the light source through the mask and via the optical system onto a portion of the photoresist layer on the substrate corresponding to the transmissive region;
• and
• developing the exposed portion of the photoresist layer to form a photoresist pattern to expose a portion of the thin film.

A method for fabricating a flat panel display device comprising:

• forming a thin film on a substrate;
• forming a photoresist layer on the thin film;
• substantially vertically disposing a mask;
• irradiating light through the mask and onto a portion of the photoresist layer;
• and
• developing the exposed portion of the photoresist layer to form a photoresist pattern to expose a portion of the thin film wherein a shape of the photoresist pattern corresponds to an element of the flat panel display device, wherein the element includes one of a gate line, a data line, a pixel electrode and a common electrode.