Electro-optic device, method for manufacturing the same, and electronic apparatus
AssigneeSeiko Epson Corporation
InventorMasashi Nakagawa
Life of this patent
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AssigneeSeiko Epson Corporation
InventorMasashi Nakagawa
Estimating the term…
An electro-optic device includes a substrate, a data line and a scanning line on the substrate, extending so as to intersect each other, a transistor disposed in a region on the substrate corresponding to the intersection of the data line and the scanning line when viewed from above, and a storage capacitor overlying the transistor. The storage capacitor includes a lower electrode, a dielectric film, and an upper electrode that are deposited in that order to define an island-shaped region where the upper electrode and the lower electrode oppose each other with the dielectric film therebetween. A display electrode is electrically connected to the storage capacitor and the transistor. A spacer insulating film having an opening is disposed in an outer region surrounding the island-shaped region above an underlayer of the lower electrode and below the upper electrode. The upper electrode extends so as to at least partially cover the spacer insulating film, and the spacer insulating film increases the distance between the ends of the lower electrode and the upper electrode in comparison with the case where the spacer insulating film is not provided.
An electro-optic device comprising:
A method for manufacturing an electro-optic device including a data line and a scanning line extending so as to intersect each other, a transistor, a storage capacitor, and a display electrode on a substrate, the method comprising:
Dependencies are inferred from the claim text.