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AssigneeFujitsu Limited
InventorsSyuzi Katase, Kazuhiko Takahashi, Masahiko Minemura, Shuji Osada
Estimating the term…
A pattern data creation method creates mask pattern data on an exposure mask, the exposure mask having a surface divided into plural unit regions and the mask pattern data including pattern data parts each defined for one of the plural unit regions, each of the pattern data parts including pattern information of a pattern included in the unit region and header information indicative of a location of the unit region on the surface of the exposure mask. The pattern data creation method includes the steps of replacing, in a part of said plural unit regions, the pattern information in the mask pattern data part with new pattern information, and reconstructing the header for that unit region in which the pattern information is replaced.
A pattern data creation method for creating mask pattern data on an exposure mask, said exposure mask having a surface divided into plural unit regions, said mask pattern data comprising pattern data parts each defined for one of said plural unit regions, each of said pattern data parts comprising pattern information of a pattern included in said unit region and header information indicative of a location of said unit region on said surface of said exposure mask, said pattern data creation method comprising the steps of:
A method of fabricating a semiconductor device, comprising the steps of:
A computer-readable medium recorded with a pattern data creation program for creating mask pattern data on an exposure mask, said exposure mask having a surface divided into plural unit regions, said mask pattern data comprising pattern data parts each defined for one of said plural unit regions, each of said pattern data parts comprising pattern information of a pattern included in said unit region and header information indicative of a location of said unit region on said surface of said exposure mask, said pattern data creation program comprising:
A computer specifically configured to execute a pattern data creation program for creating mask pattern data on an exposure mask, said exposure mask having a surface divided into plural unit regions, said mask pattern data comprising pattern data parts each defined for one of said plural unit regions, each of said pattern data parts comprising pattern information of a pattern included in said unit region and header information indicative of a location of said unit region on said surface of said exposure mask, said pattern data creation program comprising:
Dependencies are inferred from the claim text.