Exposure apparatus and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorMitsuru Hiura
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Abstract
An exposure apparatus for exposing a substrate to light via a reticle includes a reflective optical system including a plurality of reflective optical elements and configured to conduct the light, a cooling mechanism configured to cool a first optical element included in the reflective optical system and arranged on an optical path of the reflective optical system, and a controller configured to detect a load of the cooling mechanism and determine a decrease in reflectance of at least one of the plurality of reflective optical elements based on the detected load.
Claims11
An exposure apparatus for exposing a substrate to light via a reticle, said apparatus comprising:
- a reflective optical system including a plurality of reflective optical elements and configured to conduct the light;
- a cooling mechanism configured to cool a first optical element included in said reflective optical system and arranged on an optical path of said reflective optical system;
- and
- a controller configured to detect a load of said cooling mechanism and to determine a decrease in reflectance of at least one of said plurality of reflective optical elements based on the detected load.
Dependencies are inferred from the claim text.