Low-dishing composition and method for chemical-mechanical planarization with branched-alkylphenol-substituted benzotriazole

A polishing composition comprising:

• a) an abrasive;
• and
• b) a compound having the structure:
• wherein at least one of R1—R8 is a branched C4-C14 alkyl group or a branched C4-C14 aralkyl group, and R1—R8 are independently selected from the group consisting of —H, —Cl, —F, —Br, —OH, —OR, a branched C4-C14 alkyl group, a branched C4-C14 aralkyl group, and a alkylene ester group, where R is a C1-C8 alkyl group.

A polishing method comprising the steps of:

• A) placing a substrate in contact with a polishing pad;
• B) delivering a polishing composition comprising
• a)an abrasive;
• and
• b) a compound having the structure:
• wherein at least one of X1—X9 is —OH, at least one of X1—X9 is a branched C4-C14 alkyl group or a branched C4-C14 aralkyl group, and X1—X9 are independently selected from the group consisting of —H, —Cl, —F, —Br, —OH, —OR, a C1-C14 alkyl group, a C1-C14 aralkyl group, and a alkylene ester group, where R is a C1-C8 alkyl group;
• and;
• C) polishing the substrate with the polishing composition.