Substrate processing apparatus

A substrate processing apparatus for performing a processing of a substrate comprising:

• a processing bath for storing a processing solution;
• a holding mechanism that has a plurality of holding grooves for holding a plurality of substrates and is contained in the processing bath;
• a first supply part for supplying a processing solution into the processing bath;
• and
• a second supply part for expelling a processing solution to the holding grooves of the holding mechanism present in the processing bath.

A substrate processing apparatus for performing a processing of a substrate comprising:

• a first processing bath for storing deionized water;
• a second processing bath for storing a chemical solution;
• a holding mechanism that has a plurality of holding grooves for holding a plurality of substrates, that can shift from the inside of the second processing bath to the inside of the first processing bath, while holding a plurality of substrates held by the holding grooves, and that can move up and down in the first processing bath;
• a supply part for supplying deionized water into the first processing bath;
• and
• a holding part that is disposed above the supply part in the first processing bath, and that holds a plurality of substrates transferred from the holding mechanism, wherein
• with the holding mechanism holding a plurality of substrates immersed in deionized water stored in the first processing bath, a state in which a plurality of substrates are held by the holding grooves of the holding mechanism, and a state in which they are held by the holding part are repeated by allowing the holding mechanism to move up and down.

A substrate processing apparatus for performing a processing of a substrate comprising:

• a processing bath for storing a processing solution;
• a holding mechanism that has holding grooves for holding a plurality of substrates and can move up and down in the processing bath;
• a supply part for supplying a processing solution into the processing bath;
• and
• a holding part that is disposed above the supply part in the processing bath, and that holds a plurality of substrates transferred from the holding mechanism, wherein
• with the holding mechanism holding a plurality of substrates immersed in a processing solution stored in the processing bath, a state in which a plurality of substrates are held by the holding grooves of the holding mechanism, and a state in which they are held by the holding part are repeated by allowing the holding mechanism to move up and down.