Semiconductor cleaning apparatus and semiconductor cleaning method

Abstract

A semiconductor cleaning apparatus according to the present invention comprises: a particle monitor which measures the number of particles in a processing liquid used in a rinse process after a semiconductor wafer is subjected to a cleaning process by means of the processing liquid; a specific resistance measuring unit which measures a specific resistance of a processing liquid used in the rinse process; and a control unit which determines an end point at which the rinse process is completed on the basis of the number of particles measured by the particle monitor and the specific resistance measured by the specific resistance measuring unit to end the rinse process.

Dependencies are inferred from the claim text.