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US 2006/0188809 A1Published application
Resist composition and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun Hatakeyama, Takanobu Takeda
Life of this patent
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Abstract
A resist composition comprising a fullerene having five phenol derivatives is provided.
Claims6
A resist composition comprising a fullerene having the general formula (1):
- wherein R is hydrogen or an alkyl group of 1 to 4 carbon atoms, R1 to R5 each are hydrogen or an acid labile group, a, b, c, d, and e each are an integer of 0 to 2, and the sum of a+b+c+d+e is 1 to 10.
Dependencies are inferred from the claim text.